| Citation | Distinguished for his pioneering work in electron-beam lithography, microstructure fabrication and high-resolution scanning electron microscopy. By 1964 Alec Broers had succeeded in fabricating sub-micron lines in metal-semiconductor structures and also demonstrated the exposure of photoresist by electron beams - the basis of all subsequent work in the field. His work in industry, as recorded in over 100 publications, records the progressive advances which have contributed to current microelectronics and which are pointing to exciting new possibilities in yet further levels of integration. An example of the latter is provided by his recent successful demonstration of a "Squid" magnetometer with a 30 nm line-width, giving an intrinsic energy resolution of 3h - i.e. very close to the zero point fluctuation limit. |